| 摘要 |
<p>The invention relates to a process for making a cage for depositing a thin film on substrates (3) in a vapour-deposition reactor and covers a cage made by the process. The process consists in first causing a gas phase to circulate in contact with test substrates of substantially the same size as those to be treated, recording the width of the heterogeneous deposition region at the periphery of said test substrates, making radial deposit plates (10) larger than the substrates (3), defining, alone or in combination with a substrate, an area corresponding to that of said substrate plus a peripheral area of at least the same size as that of the previously determined heterogeneous region, and making a cage (9) consisting of a plurality of spaced radial deposit plates (10) each suitable for forming a radial deposit region on the periphery of a substrate (3) and substantially in the same plane as the latter.</p> |
