| 摘要 |
PURPOSE:To enable prevention of an exposure irregularity caused by defects such as a flaw on a reflecting mirror and sticking dust by constituting a reflecting surface to be movable without changing the reflecting direction and the reflecting position. CONSTITUTION:Devices in this invention are constituted by an X-ray source 1, a convex mirror 2, a mask (a photo mask or a reticle) 3 and a wafer 8. The mirror 2 is rotatable in its reflecting surface, for an example, as shown by the arrow A in the figure. An exposure beam from the X-ray source 1 is reflected at points 4 and 5 on the mirror 2 and applied to points 6 and 7 on the mask 3, respectively. Consequently, even if there exists a defect such as a flaw, at a position of the point 4 on the mirror 2, the mirror is moved by a larger movement than a size of the flaw and therewith an insufficient irradiation caused by the flaw is prevented to be concentrated at the point 6 of the mask 3 and an irradiation irregularity can be reduced. |
