| 发明名称 |
FILM BASED ON SILICON DIOXIDE AND PRODUCTION THEREOF |
| 摘要 |
A film based on silicon dioxide and containing zirconium and so forth, and a method of producing the film by reactive DC sputtering. Various multilayered films containing said film, such as those used for antireflection coating, alkali barrier film, or achromatic glass can be produced by physical vapor deposition without breaking a vacuum. |
| 申请公布号 |
WO9102102(A1) |
申请公布日期 |
1991.02.21 |
| 申请号 |
WO1990JP00982 |
申请日期 |
1990.08.01 |
| 申请人 |
ASAHI GLASS COMPANY LTD. |
发明人 |
ANDO, EIICHI;MITSUI, AKIRA;EBISAWA, JUNICHI;SUZUKI, KOICHI;MATSUMOTO, KIYOSHI;OYAMA, TAKUJI |
| 分类号 |
B32B17/10;C03C17/245;C03C17/34;C03C27/12;C23C14/08;C23C14/10;C23C14/34;G02F1/1333;G02F1/1335 |
主分类号 |
B32B17/10 |
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