发明名称 Process for growing compound semiconductor layers and detector using such layers.
摘要 A method of growing a ternary or quaternary compound semiconductor layer, including:- exposing in an enclosure (a) an initial layer comprising at least two of the elements of the compound semiconductor, and (b) a source comprising all the elements of the compound semiconductor and having the composition of an off-stoichiometric melt, heating the initial layer and the source, in the enclosure, to place them in a three-phase equilibrium condition, to grow the compound semiconductor layer on/from the initial layer, vapours from the source being transported to the initial layer. A sensing device using a compound semiconductor layer.
申请公布号 EP0413159(A2) 申请公布日期 1991.02.20
申请号 EP19900113754 申请日期 1990.07.18
申请人 FUJITSU LIMITED 发明人 SAITO, TETSUO, C/O FUJITSU LTD., PATENT DEPARTMENT;KOCHI, TETSUYA, C/O FUJITSU LTD., PATENT DEPARTMEN;YAMAMOTO, TAMOTSU, C/O FUJITSU LTD., PATENT DEPART;OZAKI, KAZUO, C/O FUJITSU LTD., PATENT DEPART;YAMAMOTO, KOSAKU, C/O FUJITSU LTD., PATENT DEPART
分类号 H01L21/205;C30B23/02;H01L21/363;H01L21/365;H01L21/86;H01L31/18 主分类号 H01L21/205
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