Chemical vapor deposition,申请号US19890411226-传众专利搜索

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发明名称	Chemical vapor deposition
摘要
申请公布号	US4993361(A)	申请公布日期	1991.02.19
申请号	US19890411226	申请日期	1989.09.22
申请人	UNVALA LIMITED	发明人	UNVALA, BHIKHU A.
分类号	C23C14/22;C23C16/448;C30B25/02	主分类号	C23C14/22
代理机构		代理人
主权项
地址

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