| 摘要 |
PURPOSE:To form a film thickness of 1- several mum without yielding bubbles, by depositing fine particles of the oxide glass on a substrate in sputtering atmosphere of He, Ne, or mixed gas thereof, and thereafter heating and baking the particles at or above the deforming temperature of the oxide glass. CONSTITUTION:The sputtering atmospheric gas is ionized, accelerated by an electric field, collided with a target in order to strike out the fine particles of the oxide glass. The fine particles of the oxide glass are deposited on the substrate in the vicinity of the target. The confined atmospheric gas gathers together owing to the deformation of the fine particles of the glass and the combination among the fine particles when they are heated and baked. The gas is expanded by the heat and becomes the bubbles. Before the gas becomes the bubbles, the gas, which tends to transmit through the thin glass film and to disperse, is used as the sputtering atmosphere. When the atmosphere whose main component is He, Ne, or the mixed gas, thereof, whose transmitting coefficient in the oxide glass is large, is used, the thin film of the oxide glass which cannot be conventionally implemented can be formed without bubbles. |
