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发明名称
Dopant-independent polysilicon plasma etch
摘要
申请公布号
US4992134(A)
申请公布日期
1991.02.12
申请号
US19890436282
申请日期
1989.11.14
申请人
ADVANCED MICRO DEVICES, INC.
发明人
GUPTA, SUBHASH;SAHOTA, KASHMIR
分类号
H01L21/302;H01L21/3065;H01L21/3213;H01L21/8238;H01L27/092
主分类号
H01L21/302
代理机构
代理人
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