发明名称 RESIST DEVELOPMENT PROCESSING DEVICE AND QUALITY CONTROL FOR DEVELOPING SOLUTION
摘要 PURPOSE:To facilitate quality control of a developing solution by performing irradiation of ultraviolet light having wavelength of the absorption edge of the developing solution and evaluating the extent of deterioration of the developing solution after measuring the absorbance. CONSTITUTION:This device is equipped with a developing solution vessel 2 and a measuring part 3 and is composed of at least a measuring tube 5 which circulates a developing solution 1 by means of a pump 4, a measuring system which measures the absorbance of the developing solution 1 in the measuring part 3 by means of a light source 6 applying ultraviolet light and a photometer 7, and a monitoring part 8 which monitors variations of the absorbance. Then, this device irradiates the developing solution 1 with ultraviolet light having a wavelength of the absorption edge of the developing solution and then, the deterioration of its solution resulting from the increase of the absorbance is measured and its quality is controlled. Accordingly, with the deterioration of the quality of an organic alkali system developing solution 1, its solution produces amine derivatives having a nitro group. Since the absorption edge shifts toward longer wavelengths, the amine derivatives produced are monitored by means of the photometer and, if the absorbance at the absorption edge, i.e. 260nm wavelength reaches a defined value, the developing solution 1 is replaced. The quality of the developing solution is thus controlled easily.
申请公布号 JPH0330314(A) 申请公布日期 1991.02.08
申请号 JP19890164632 申请日期 1989.06.27
申请人 FUJITSU LTD 发明人 SHIROMIZU YOSHIMI
分类号 G03F7/30;H01L21/027;H01L21/30 主分类号 G03F7/30
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