发明名称
摘要 PURPOSE:To check generation of breakage and a crack in a semiconductor chip by absorbing stress through elasticity of electrode leads when the semicon- CONSTITUTION:Electrode leads 3 are formed on the pads 2 of a chip 1 using a Cu wire plated with Ni. A Cu film is formed to be about 2mum in thickness.
申请公布号 JPH039620(B2) 申请公布日期 1991.02.08
申请号 JP19850065673 申请日期 1985.03.29
申请人 FUJITSU LTD 发明人 YOKOCHI KISHIO;SUZUKI JUICHI
分类号 H01L21/60 主分类号 H01L21/60
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