Trace impurity removal from inert or noble gas - using successive packings of metal, esp. calcium, and hydride storage material

摘要

Trace impurities are removed from inert or noble gases by passage over (i) a first granular packing of gp. IIa metal or alloy of gp. IIa and IIIa metals to remove a first gp. of impurities; and (ii) a second packing of hydride storage material to remove a second gp. of impurities. USE/ADVANTAGE - Process is used for prodn. of ultra-pure inert or noble gases, esp. N2, for the semiconductor industry. Impurity contents are reduced to max. 0.1 vol. ppm. rapidly, simply and inexpensively.