发明名称 PRODUCTION OF NOVOLAK RESIN FOR POSITIVE TYPE PHOTORESIST
摘要 PURPOSE:To improve resolving power and sensitivity and to improve heat resistance by adding meta-cresol and aldehydes to a resol type resin obtd. by bringing para-cresol and aldehydes into reaction in the presence of a basic catalyst and further, bringing the same into reaction in the presence of an acidic catalyst. CONSTITUTION:The meta-cresol and aldehydes are added to the resol type resin compsn. obtd. by bringing the para-cresol and aldehydes into reaction in the presence of the basic catalyst and further the reaction is effected in the presence of the acidic catalyst. The molar ratio of the para-cresol and meta-cresol is in a 1/10 to 1/2 range and the weight average mol. wt. of the novolak resin is 3,000 to 15,000. The good pattern shape is obtd. and the heat resistance, resolution and sensitivity are improved in this way.
申请公布号 JPH0329950(A) 申请公布日期 1991.02.07
申请号 JP19890165754 申请日期 1989.06.28
申请人 GUN EI CHEM IND CO LTD 发明人 GOKAN KYOICHI;KURIMOTO YOSHIAKI;FUKUDA TSUYOSHI;KIMURA YOKO;HASEGAWA TADASHI
分类号 G03F7/023;C08G8/08;C08G8/12;H01L21/027 主分类号 G03F7/023
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