VERFAHREN ZUR FOTOLITHOGRAFISCHEN HERSTELLUNG VON STRUKTUREN NACH DEM PRINZIP DER ABHEBETECHNIK.,申请号DE19843483848-传众专利搜索

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发明名称	VERFAHREN ZUR FOTOLITHOGRAFISCHEN HERSTELLUNG VON STRUKTUREN NACH DEM PRINZIP DER ABHEBETECHNIK.
摘要
申请公布号	DE3483848(D1)	申请公布日期	1991.02.07
申请号	DE19843483848	申请日期	1984.04.19
申请人	SIEMENS AG, 8000 MUENCHEN, DE	发明人	BULST, DIPL.-PHYS., WOLF-ECKHART, D-8011 VATERSTETTEN, DE;KEINATH, DIPL.-ING., PETER, D-8000 MUENCHEN 80, DE;LINDEMANN, GERTRUD, D-8000 MUENCHEN 90, DE
分类号	G03F7/09;(IPC1-7):G03F7/09	主分类号	G03F7/09
代理机构		代理人
主权项
地址

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