发明名称 |
RESIST PEELING DEVICE |
摘要 |
PURPOSE:To acquire ozone of high concentration by an ozone generating device of a small capacity and to reduce a production cost by collecting unused ozone inside a sealed treatment vessel for resist peeling to an ozone generating device after dehydrating and cooling the ozone. CONSTITUTION:Ozone 9 is supplied to a substrate 7 which is coated with a resist 6 from an ozone generating device 5 in a sealed treatment vessel 1. The resist 6 is oxidized by the ozone 9 and peeled as carbon dioxide and water vapor. Ozone remaining unused during the oxidation reaction is collected to a gas collector 14 and water vapor thereof is absorbed at a moisture removing section 12 and collected to the ozone generating device 5. The ozone 9 which is heated to a high temperature in the vessel 1 is cooled by a cooling pipe 13 and decomposition can be prevented. Therefore, a part of ozone which had been exhausted as unused in a peeling treatment is used again. Ozone of high concentration can be acquired by a generating device of a small capacity in this way. |
申请公布号 |
JPH0327518(A) |
申请公布日期 |
1991.02.05 |
申请号 |
JP19890160689 |
申请日期 |
1989.06.26 |
申请人 |
SHIBAURA ENG WORKS CO LTD |
发明人 |
NAKAMURA MOTOHIKO;KUROKAWA SADAAKI |
分类号 |
G03F7/42;H01L21/027;H01L21/30;H01L21/302;H01L21/3065 |
主分类号 |
G03F7/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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