| 摘要 |
PURPOSE:To efficiently execute the element analysis of the foreign matter contained in a sample and the observation of its shape, etc., down to the deep part of the sample by ion milling the sample surface irradiated with an electron beam. CONSTITUTION:The irradiated part of the sample 1 is ion milled and a very small recess 1a is formed on the surface of the sample when the very small part of the sample 1 is irradiated with the ion beam 10 focused by an ion milling device 9. An X-ray 4 of a specific wavelength and the secondary electron 6 specified by the shape are respectively radiated from the element contained in the very small foreign matter 11 existing in the bottom of the recess 1a when the ion-milled recess 1a of the sample 1 is irradiated with the finely focused electron beam 2 while the beam is scanned. The X-ray 4 of the specific wavelength and the secondary electron 6 are detected by the method similar to the conventional method and the detection signal thereof is processed by which the element analysis of the material contained in the foreign matter and the shape observation of the foreign matter are simultaneously executed. |
