发明名称 WERKWIJZE VOOR HET VERVAARDIGEN VAN EEN KUISMASKER.
摘要 An apparatus and a method for making a reticle mask is disclosed. A reticle mask is made by the double pass method wherein scribe lines are first drawn on the reticle mask. Thereafter, a product die pattern is made in the reticle mask by a plurality of times. A plurality of alignment marks are associated with each product die pattern. The plurality of alignment marks are all written in the scribe line region. Thus, any deviation of the relative position of the product die pattern to the scribe line may be quantified.
申请公布号 NL8920369(A) 申请公布日期 1991.02.01
申请号 NL19890020369 申请日期 1989.04.11
申请人 VLSI TECHNOLOGY, INC. TE SAN JOSE, CALIFORNIE, VER. ST. V. AM. 发明人
分类号 G03F1/00;G03F7/20;G03F9/00;H01L21/027;H01L21/30 主分类号 G03F1/00
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