METHOD AND APPARATUS FOR CLEANING OF SEMICONDUCTOR SUBSTRATE,申请号JP19890158784-传众专利搜索

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发明名称	METHOD AND APPARATUS FOR CLEANING OF SEMICONDUCTOR SUBSTRATE
摘要
申请公布号	JPH0323635(A)	申请公布日期	1991.01.31
申请号	JP19890158784	申请日期	1989.06.21
申请人	MITSUBISHI ELECTRIC CORP	发明人	KABASAWA MASAYA
分类号	H01L21/304	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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