| 摘要 |
PURPOSE:To obtain a negative type radiation sensitive resist superior in sensitivity, resolution, and dry etching resistance, by using a polymer having an aminomethyl-substituted aromatic ring as a radiation sensitive polymer. CONSTITUTION:A thin film of a radiarion sensitive polymer consisting of a polymer containing at least >= 10% repeating units represented by the general formula (in which R, R' are H or 1-6C alkyl, and n representing the number of substituents of 1, 2, or 3) is formed on a substrate, irradiated with radiation, such as electron beams, developed, and etched. Said polymer may be a homopolymer consisting only of the repeating units represented by the formula, or a copolymer of this monomer and a component, auch as vinylpyridine or styrene, but a polymer has, preferably, a narrow range of molecular weight. |
