| 摘要 |
PURPOSE:To remove an ionizing radiation resist composed of a high molecular compound completely in a short time by applying energy beams in an oxidizing gas atmosphere. CONSTITUTION:When an organic high molecular compound is irradiated with energy beams in an oxidizing gas atmosphere such as oxygen gas containing ozone, the chemical bonds of the compound are cut. The compound is oxidative- destructed by oxygen atoms under an excitation state generated and gasified by simultaneously irradiating ozone with energy beams. The action of oxidative destruction gives damage to the surface of a substrate 1 because oxidizing power is too strong. However, oxidizing power can be controlled by mixing an inert gas into an oxidizing gas. Accordingly, the substrate 1 on which a reflecting chromium 2 layer is formed particularly is not damaged, and the ashing of the organic high molecular compound such as a resist 3 can be conducted in a short time. |
