| 发明名称 |
MALEIMIDE CONTAINING, NEGATIVE WORKING DEEP UV PHOTORESIST |
| 摘要 |
A method for producing a negative image by coating a substrate with a photosensitive layer containing a self-crosslinkable maleimide copolymer capable of crosslinking in the presence of a photogenerated acid and heat. The composition is coated and dried on a substrate, then imagewise exposed, baked and developed with an aqueous alkaline solution.
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| 申请公布号 |
CA2020378(A1) |
申请公布日期 |
1991.01.29 |
| 申请号 |
CA19902020378 |
申请日期 |
1990.07.04 |
| 申请人 |
HOECHST CELANESE CORPORATION |
发明人 |
JAIN, SANGYA;POTVIN, ROBERT E.;KHANNA, DINESH N. |
| 分类号 |
G03F7/038;G03F7/075;H01L21/027;(IPC1-7):C08F212/08;C08F216/14;G03F7/022;G03F7/039 |
主分类号 |
G03F7/038 |
| 代理机构 |
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