发明名称 MULTILAYERED INTERCONNECTION FORMATION MASK
摘要 PURPOSE:To make it possible to bore a through hole on each insulation layer, if a kind of insulation layer mask is provided, by installing a land pattern, a through hole pattern, a first and second masks. CONSTITUTION:A land pattern 22, which is provided in a circuit layout mask in a part corresponding to a specified point 23 where an interconnection layer is connected, is installed to an insulation mask. Moreover, a through hole pattern 17 is provided in a insulation mask at a part corresponding to the specified point 16 where at least two interconnection layers are connected. Further, at least one first mark 25 provided based on a positioning reference point on a plurality of interconnection layer masks are installed to the insulation layer mask. In addition, second marks 19a to 19d are installed there, which allow a through hole pattern 17 to be deviated as specified in a different direction, centering on a specified point 15 when they are arranged to meet the first mark 25 for the plurality of interconnection layer masks. This construction makes it possible to bore a through hole in each insulation layer, if a kind of insulation layer mask is provided.
申请公布号 JPH0321097(A) 申请公布日期 1991.01.29
申请号 JP19890154615 申请日期 1989.06.19
申请人 NIPPON TELEGR & TELEPH CORP <NTT> 发明人 YASUDA TOYOJI;KON TAICHI;YAMAGUCHI SATORU
分类号 H05K3/46 主分类号 H05K3/46
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