发明名称 SEMICONDUCTOR MANUFACTURING DEVICE
摘要 PURPOSE:To facilitate removal of scums and residue at pattern edges by providing an aspirating nozzle with an ultrasonic vibrator. CONSTITUTION:An aspirating nozzle 3 which produces an atomized developer 6 is equipped with an ultrasonic vibrator 7. When pressurized nitrogen, inactive gas, and the developer are mixed and formed into atomized particle shapes, the developer 6 receives kinetic energy which is obtained by converting vibration energy from the ultrasonic vibrator 7 into kinetic energy in addition to having kinetic energy as a result of pressurizing nitrogen and inactive gas. Eventually, the atomized developer 6 which has kinetic energy exceeding conventional kinetic energy beats the surface of a resist 4 heavily and its beating accelerates the rate of development. This blows off scums and residua easily at pattern edges in terms of physico-chemical treatment.
申请公布号 JPH0320017(A) 申请公布日期 1991.01.29
申请号 JP19890155447 申请日期 1989.06.16
申请人 MATSUSHITA ELECTRON CORP 发明人 MITSUI SHINJI
分类号 G03F7/30;H01L21/027;H01L21/30 主分类号 G03F7/30
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