首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
FORMATION OF FINE RESIST PATTERN FOR LIFT-OFF
摘要
申请公布号
JPH0321011(A)
申请公布日期
1991.01.29
申请号
JP19890156278
申请日期
1989.06.19
申请人
SUMITOMO ELECTRIC IND LTD
发明人
YUI MASARU
分类号
H01L21/3205;H01L21/027
主分类号
H01L21/3205
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Foamable photo-polymerized composition
Method for treating tar
Mass spectrometer
Array with light-emitting power semiconductor component and corresponding production method
Method of fabricating a microfabricated high aspect ratio device with electrical isolation
Method and device for detecting microbiologically induced corrosion
TANGO 332 polypeptides
Screening methods for compounds useful in the regulation of cell proliferation
Fabric air duct with directional vent
Dual-display module with a tunable mirror sheet
Bluetooth TDI and winsock interface
Adjustable pyrotechnic-gas shock absorber
Lid member for food container
Water-soluble block copolymer and production method therefor
Microlens array
Dielectric resonator device, filter, duplexer, and communication apparatus
Simplified digital settop box
System and method for extracting instruction boundaries in a fetched cacheline, given an arbitrary offset within the cacheline
Semiconductor device and method of manufacturing the same
System and method for evaluating risk of mortality due to congestive heart failure using physiologic sensors