| 摘要 |
PURPOSE:To shorten exposure time by increasing exposing light quantity by making a glass part of a contacting hole pattern part into a lens shape. CONSTITUTION:This photomask is constituted of a convex lens 5 formed in the contacting hole part on a glass surface of a glass substrate 1, a concave lens 6 is formed in the contacting hole part on the pattern surface, and a light shielding film 2 formed on other pattern surfaces. Thus, plane wave light from light source 3 which irradiates the convex lens 5 part is deflected, made into a concave shaped wave surface condensing toward the concave lens 6, to irradiate over a water as plane wave exposing light 4. |
