| 摘要 |
<p>PURPOSE:To make it possible to obtain a highly precise thin film resistor corresponded to the desired resistance value at a high yield rate by a method wherein a dummy resistor is formed on a substrate by patterning a conductive film, the patterning dimensions of the conductive film is determined based on the resistance value of the resistor, and a pattern is formed. CONSTITUTION:On the part other than the position where a desired resistor will be formed, the part 5a, to be left as the dummy electrode of a conductive film 3, and the entire surface excluding the part 5a, which becomes a dummy resistor, are coated with a photoresist and the like, the conductive film 3 on the part of the 5a' is removed by etching, and a dummy resistor to be used for measurement of a sheet resistance value is formed. After said dummy electrode pattern has been formed, the photoresist and the like are removed. The sheet resistance value of a resistance film 2 can be calcurated easily by measuring the electric resistance and the measurements between the dumny electrode 5a and a common electrode 14. A pattern is formed by selecting a photomask with a pattern which is most closely allied to the obtained dimensional data from the photomasks of different dimensions which are arranged in advance.</p> |
