| 摘要 |
PURPOSE:To prevent the defect of a reticle securely and to operate an apparatus efficiently by providing a reticle storing device, an inspecting device for particles on the surface of a pellicle, a particle removing device and an automatic reticle conveying device. CONSTITUTION:A main body 1 of a reducing-projection exposure apparatus, a reticle storing device 2, a pellicle-surface-particle inspecting device 3, a pellicle- surface-particle removing device 4, and an automatic reticle conveying device 5 for conveying the reticle automatically between the devices are provided. When the reticle which is used in this constitution is judged as fail by the inspection conducted with the pellicle-surface-particle inspecting device 3, the reticle is quickly sent into the pellicle-surface-particle removing device 4 by automatic conveyance. The particle is removed securely. The reticle is conveyed to the pellicle-surface-particle inspecting device 3 again. When the reticle passes the inspection, the reticle is sent into the reducing-projection exposure apparatus (a). Thus, the reducing-porjection exposure apparatus can be operated efficiently without the occurrence of defects. |
