| 摘要 |
PURPOSE:To provide a photosensitive composition sensitive to radiations shorter in wavelength and superior in resistance to dry etching and capable of forming a fine pattern high in precision by incorporating an alkali-soluble polymer having a phenol skeleton and an oxygen-containing heterocyclic compound and a compound to be allowed to release an acid by photoirradiation. CONSTITUTION:The photosensitive composition contains the alkali-soluble polymer having a phenol skeleton and the compound represented by general formula I and the compound to be allowed to release an acid by photoirradiation, is well sensitive to deep ultraviolet rays and high in resolution and so, it can form a fine pattern. The use of the alkali-soluble polymer permits development by an aqueous solution of alkali. As the alkali-soluble polymer having the phenol skeleton, novolak resins synthesized from usual alkali-soluble resins, polysiloxane and polysilane having phenol groups on the side chains, phenol having silicon atoms on the side chains, and the like can be enumerated. |
