发明名称 METHOD FOR REMOVING PHOTORESIST FILM
摘要 PURPOSE:To prolong the life of a reaction liquid by using an aq. soln. of peroxysulfuric acid as a photoresist removing liquid and adding a peroxysulfuric acid to this soln. CONSTITUTION:An exothermic reaction takes place and the nascent oxygen is generated when the peroxysulfuric acid (H2SO5) is dissolved in water (H2O). This oxygen decomposes the photoresist film consisting of (C, H) into carbon dioxide (CO2) and the water (H2O). The number of the water molecules does not change before and after the reaction in this reaction and, therefore, there is no effect of diluting the peroxysulfuric acid liquid by this reaction at all and the oxidation effect is maintained by the addition of the peroxysulfuric acid. The life of the reaction liquid is prolonged in this way.
申请公布号 JPH0315850(A) 申请公布日期 1991.01.24
申请号 JP19890151915 申请日期 1989.06.14
申请人 MATSUSHITA ELECTRON CORP 发明人 TAKAYAMA YUICHIRO;NISHIMURA KOICHI
分类号 G03F7/42;H01L21/027;H01L21/30 主分类号 G03F7/42
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