| 摘要 |
<p>PURPOSE:To perform highly accurate pattern transfer; besides, prevent the destruction of X-ray absorbents during the manufacture of X-ray mask structures or during normal service of them by forming the X-ray absorbents which exhibit high properties adherent to a film permeable to X-rays on the film that is permeable to the X-rays and exhibits low thermal expansion and high heat transmission properties. CONSTITUTION:A film 2 permeable to X-rays, X-ray absorbents 3, and a holding frame 1 are provided in such a way that the film 2 consists of a single layer film having aluminum and nitrogen as main components or a laminated film which contains at least the above single layer film and the X-ray absorbents 3 have a metal that is held on the film 2 as well as nitrogen as the main components and further, the holding frame 1 holds the film 2 perme able to X-rays. Having aluminum and nitrogen as the main components, the film 2 exhibits low thermal expansion properties and yet, has high heat transmission properties and prevents the rise of a temperature due to absorption of the X-rays. On the other hand, having the metal and nitrogen as the main components, the X-ray absorbents 3 exhibit high properties adherent to the film 2. This enables these elements to form patterns equipped with a hyper-fine high aspect ratio and the destruction of the patterns due to stress that is established on the occasion of forming a protecting film (or secondary electron anti-scattering film) made of polyimide and the like on the X-ray absorbents 3 is prevented.</p> |
