发明名称 Semiconductor optical device having a variable refractive index profile.
摘要 <p>A semiconductor optical device for focusing an optical beam comprises a substrate (11) doped to a first conduction type, a semiconductor layer (13) doped to a conduction type different from that of the substrate, a recombination region (12) formed between the substrate and the second semiconductor layer, a first electrode (14) provided on a bottom surface of the substrate, and a second electrode (15) provided on a top surface of the second semiconductor layer, wherein the first electrode means is transparent to the optical beam and passing the optical beam freely therethrough, said second electrode means is provided with a passage of the optical beam with a size at least exceeding the carrier diffusion length in the semiconductor layer, so that there appears a profile of refractive index in the recombination region such that the refractive index assumes a minimum refraction index in correspondence to a center of the circular passage and a maximum refraction index in correspondence to an edge of the passage.</p>
申请公布号 EP0409605(A2) 申请公布日期 1991.01.23
申请号 EP19900307875 申请日期 1990.07.19
申请人 FUJITSU LIMITED 发明人 TABUCHI, HARUHIKO
分类号 G02F1/015;G02F1/29 主分类号 G02F1/015
代理机构 代理人
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