发明名称 |
Semiconductor manufacturing apparatus |
摘要 |
A semiconductor manufacturing apparatus includes members for uniformly supplying a reactant gas into a chamber and uniformly discharging it from the chamber, and two rectifying members disposed on opposite sides of a substrate for making the flow rate and the direction of the reactant gas constant. This arrangement ensures that the surface of the substrate is processed with a high degree of accuracy.
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申请公布号 |
US4986216(A) |
申请公布日期 |
1991.01.22 |
申请号 |
US19890387062 |
申请日期 |
1989.07.31 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
OHMORI, TOSHIAKI;FUKUMOTO, TAKAAKI |
分类号 |
H01L21/302;H01L21/00;H01L21/205;H01L21/31 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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