发明名称 Semiconductor manufacturing apparatus
摘要 A semiconductor manufacturing apparatus includes members for uniformly supplying a reactant gas into a chamber and uniformly discharging it from the chamber, and two rectifying members disposed on opposite sides of a substrate for making the flow rate and the direction of the reactant gas constant. This arrangement ensures that the surface of the substrate is processed with a high degree of accuracy.
申请公布号 US4986216(A) 申请公布日期 1991.01.22
申请号 US19890387062 申请日期 1989.07.31
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 OHMORI, TOSHIAKI;FUKUMOTO, TAKAAKI
分类号 H01L21/302;H01L21/00;H01L21/205;H01L21/31 主分类号 H01L21/302
代理机构 代理人
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