发明名称 |
Thin film forming apparatus |
摘要 |
A thin film forming apparatus of the present invention comprises: a reaction chamber for receiving therein a substrate and a thin film forming gas; an ultraviolet laser beam oscillator for generating an ultraviolet laser beam for causing dissociation of the thin film forming gas to thereby form a thin film over the surface of the substrate; and a plasma generator for generating ions for controlling growth of a thin film.
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申请公布号 |
US4986214(A) |
申请公布日期 |
1991.01.22 |
申请号 |
US19870133837 |
申请日期 |
1987.12.16 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
ZUMOTO, NOBUYUKI;TAKAHAMA, TORU;HOSHINOUCHI, SUSUMU;MORITA, NORIKO |
分类号 |
C23C16/48;C23C16/517;H01J37/32 |
主分类号 |
C23C16/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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