| 发明名称 |
EXPOSURE PROCESS |
| 摘要 |
K-17672/= Exposure Process The process for the preparation of photostructured layers by exposing a positivephotoresist through a perforated material which is impervious to light saves thetime-consuming and expensive preparation of film patterns for solder varnishes.
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| 申请公布号 |
CA2021474(A1) |
申请公布日期 |
1991.01.21 |
| 申请号 |
CA19902021474 |
申请日期 |
1990.07.18 |
| 申请人 |
CIBA-GEIGY AG |
发明人 |
LOSERT, EWALD;HONEGGER, BEAT;MEIER, KURT |
| 分类号 |
G03F1/08;G03F7/20;H05K3/00;H05K3/28;H05K3/34;(IPC1-7):G03F5/02 |
主分类号 |
G03F1/08 |
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