发明名称 TREATING METHOD OF SUBSTANCE TO BE TREATED
摘要 PURPOSE:To make the concentration of a treatment solution uniform substantially and thereby to enable execution of stable treatment without being affected by the concentration by a method wherein the treatment solution filled up in supply tanks is detected and registered for setting in sequence and is supplied in sequence from the supply tanks. CONSTITUTION:A vessel mechanism 3 placed on a holdup tank, a supply means 4 for supplying a developer to the holdup tank and a control means 5 for controlling the vessel mechanism 3 and the supply means 4 are provided. The supply means 4 comprises a pressing mechanism 7 for applying a pressure to a liquid surface in at least three canisters 6 wherein the developer is held on standby and a detecting mechanism 8 detecting that a treatment solution is filled up in the canisters 6. When the developer is filled up in each of the canisters 6, the time when the developer is filled up is registered for setting in the sequence of filling up, and the developer is supplied to a wafer from the canister in the sequence of registration for setting. According to this constitution, the time of staying in the canisters becomes equal substantially, the developer having stayed equally substantially in this way is supplied to the wafer, and thus execution of stable developing treatment is enabled.
申请公布号 JPH0311617(A) 申请公布日期 1991.01.18
申请号 JP19890146118 申请日期 1989.06.08
申请人 TOKYO ELECTRON LTD;TOKYO EREKUTORON KYUSHU KK 发明人 YAMAHIRA YUTAKA;MATSUYAMA YUJI
分类号 G03F7/30;B01J19/00;H01L21/027;H01L21/30 主分类号 G03F7/30
代理机构 代理人
主权项
地址