| 摘要 |
PURPOSE:To prevent the deviation from the exposure assigned position by electric charge when charged beams are irradiated by coating photoconductive resist in double structures on a wafer thereby making a substrate for charged beam exposure. CONSTITUTION:Polyvinyl carbazole is first coated as photoconductive resist on a wafer 1, and other resist of the same exposure type, for example, polydiallyl orthophthalate, is coated thereon to about 1.5mum film thickness, whereby the deviation by electric charge is virtually eliminated and the decrease in resolving power is relatively reduced. |
