发明名称 PHOTOSENSITIVE COMPOSITION
摘要 PURPOSE:To improve wear resistance and to extend development latitude by incorporating polyester or modified polyester and an o-quinonediazido compd. CONSTITUTION:Polyester or modified polyester and an o-quinonediazido compd. as a sensitizer are incorporated. The polyester may be polyester having phenolic hydroxyl groups derived from polycarboxylic acid components including dicarboxylic acid having phenolic hydroxyl groups or a deriv. thereof and polyol components. The o-quinonediazido compd. is a compd. having at least one o- quinonediazido group, the solubility in an aq. alkali soln. is increased by irradia tion with active rays of light and the ester of various hydroxyl compds. with o-benzoquinonediazidosulfonic acid or o-naphthoquinonediazidosulfonic acid is suitable for use as the o-quinonediazido compd. A photosensitive compsn. having satisfactory wear resistance and developable under satisfactory wide conditions is obtd.
申请公布号 JPH039360(A) 申请公布日期 1991.01.17
申请号 JP19890142914 申请日期 1989.06.07
申请人 DAINIPPON INK & CHEM INC 发明人 NAKAMURA CHIAKI;OE KOJI
分类号 G03F7/023;G03F7/00;G03F7/022;G03F7/032 主分类号 G03F7/023
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