发明名称 PHOTOSENSITIVE COMPOSITION
摘要 PURPOSE:To form a fine pattern having superior transparency in a visible region as well as high sensitivity to g line, superior shelf stability and satisfactory strength by incorporating a specified photosensitive diazo compd. as a sensitizer. CONSTITUTION:A photosensitive diazo compd. represented by fomula I is incorpo rated as a sensitizer. In the formula I, each of R1 and R2 is alkyl, aryl or aralkyl, R3 is H, methyl or phenyl, each of R4 -R7 is H, alkyl, aryl, aralkyl, alkoxy, halogen, hydroxyl or carboxyl, X<-> is an anion capable of forming a diazonium salt and (n) is an integer of 2-200. A fine pattern having superior transparency in a visible region as well as high sensitivity to g line of 436 nm wavelength, superior shelf stability and satisfactory strength can be formed.
申请公布号 JPH039359(A) 申请公布日期 1991.01.17
申请号 JP19890143826 申请日期 1989.06.06
申请人 TOSHIBA CORP 发明人 SANADA SHINICHI
分类号 G03F7/021;H01L21/027 主分类号 G03F7/021
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