发明名称 Semiconductor integrated circuit device and logic correcting method of the same.
摘要 <p>A semiconductor integrated circuit device comprises logic elements provided on a semiconductor substrate and laminated wiring layers formed by alternately laminating insulation layers (111) and wiring layers (S1 - S5) on the logic elements. The logic elements are connected by the laminated wiring layers. The laminated wiring layers are formed by a lower wiring layer (LL; S1 - S3) and an upper wiring layer (UL; S4 - S5) laid on the lower wiring layer. Part of a net connecting the logic elements includes terminals (140 - 147) in the upper wiring layer (UL) and is connected therewith. Namely, part of the net passes through the upper wiring layer (UL). The semiconductor integrated circuit device further comprises unused logic elements not connected with any other logic elements and a logic element having a disable terminal (300), wherein input/output terminals (214, 216, 218) of the unused logic element and the disable terminal (300) are led into the upper wiring layer (UL). Logic correction of the semiconductor integrated circuit device is carried out by altering connecting pattern between the terminals (140 - 147) at a part of the net using the upper wiring layer, connecting the input/output terminals (214, 216, 218) of the unused logic element with the other terminals (210a, 210b) and connecting the disable terminal (300) to the predetermined wirings. Namely, the wiring layers (S1, S2, .....) are structured in the semiconductor integrated circuit device provided with many laminated wiring layers (S1, S2, .....) so that correction of wiring layers may be realized only at the upper wiring layer UL.</p>
申请公布号 EP0408060(A2) 申请公布日期 1991.01.16
申请号 EP19900113461 申请日期 1990.07.13
申请人 HITACHI, LTD. 发明人 USAMI, MITSUO;AKIMORI, HIROYUKI
分类号 H01L21/3205;H01L21/82;H01L23/52;H01L23/525;H01L27/118 主分类号 H01L21/3205
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