发明名称 |
NARROW BAND EXCIMER LASER AND WAVELENGTH DETECTING APPARATUS |
摘要 |
A narrow band excimer laser and a wavelength detecting apparatus are suitable for use as a light source of a reduction projection aligner of a semiconductor device manufacturing apparatus. In the excimer laser, the ruling direction and the beam expanding direction of a prism beam expander are made substantially coincide with each other, and a polarizing element causing selective oscillation of a linearly polarized light wave substantially parallel with the beam spreading direction of a prism beam expander is contained in a laser cavity. A window at the front or rear side of a laser chamber is disposed such that the window make a Brewster's angle with respect to the axis of the laser beam in a plane containing the beam expanding direction of the prism expander and the laser beam axis. An anti-reflection film which selectively prevents reflection of a polarized light component substantially parallel to the direction of beam expanding of a prism beam expander is coated on one surface of a prism that constitutes the prism beam expander. The wavelength detecting apparatus is constructed to input a reference light and a light to be detected upon the etalon. The light transmitting through the etalon is condensed to focus on a light detector for detecting the wavelength of the laser beam based on interference fringe detected by the light detector.
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申请公布号 |
CA2063600(A1) |
申请公布日期 |
1991.01.15 |
申请号 |
CA19902063600 |
申请日期 |
1990.07.12 |
申请人 |
KABUSHIKI KAISHA KOMATSU SEISAKUSHO |
发明人 |
WAKABAYASHI, OSAMU;KOWAKA, MASAHIKO;KOBAYASHI, YUKIO |
分类号 |
G01J9/02;G03F7/20;H01S3/00;H01S3/08;H01S3/139;H01S3/225;(IPC1-7):H01S3/00;H01S3/105 |
主分类号 |
G01J9/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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