| 摘要 |
<p>2056358 9101514 PCTABS00003 Apparatus for excimer laser image projection ablation of a target material comprising a projection lens system (5, 6) for projecting a mask pattern to be ablated onto the target, which lens system is telecentric towards the image (target) end of the projection path, and means for moving the target along the projection path whereby in use the size of the projected image areas to be ablated from the target is adjusted substantially without altering their relative positions on the target.</p> |
