发明名称 |
Electronic beam drawing apparatus |
摘要 |
An electron beam drawing apparatus having a grounded conductor for a screening operation in the neighborhood of a detection surface of a detector to detect a reflected electrons obtained by irradiating an electron onto a specimen and a secondary electron generated through the electron irradiation. The conductor has openings to pass therethrough the reflected electron and the secondary electron. As a result, the electric charge accumulated on an organic substance fixed onto the front surface of the detector through the electron irradiation is prevented from exerting an influence on the drawing electron beam.
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申请公布号 |
US4983864(A) |
申请公布日期 |
1991.01.08 |
申请号 |
US19890328854 |
申请日期 |
1989.03.27 |
申请人 |
HITACHI, LTD. |
发明人 |
MURAI, FUMIO;OKAZAKI, SHINJI |
分类号 |
H01L21/027;H01J37/02;H01J37/248 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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