| 发明名称 |
Magnetically enhanced RIE process and apparatus |
| 摘要 |
An etching process and apparatus employ a novel magnetic enhancement means and a substantially pure molecular bromine plasma in order to perform in a desired manner for a number of important applications requiring etching of single-crystal and polycrystalline silicon.
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| 申请公布号 |
US4983253(A) |
申请公布日期 |
1991.01.08 |
| 申请号 |
US19880199945 |
申请日期 |
1988.05.27 |
| 申请人 |
UNIVERSITY OF HOUSTON-UNIVERSITY PARK |
发明人 |
WOLFE, JOHN C.;EL-MASRY, AHMED M.;FONG, FU-ON |
| 分类号 |
H01J37/34;H01L21/3065;H01L21/3213 |
主分类号 |
H01J37/34 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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