发明名称 POSITIVE TYPE PHOTORESIST COMPOSITION
摘要 PURPOSE:To provide the compsn. which ahs a high resolution and is large in the change of a developing speed with respect to a change of an exposure in particular, i.e. large in r value and with which beautiful patterns are obtain able by incorporating a specific arom. anino compd., phenolic compd. and amino group-contg. polyvalent phenolic compd. which are respectively specific into the compsn. CONSTITUTION:The arom. amino compd. expressed by formula I, the phenolic compd. expressed by formula II and the amino group-contg. polyvalent phenolic compd. obtd. by bringing at least one kind of the aldehydes selected from alkyl aldehyde and aryl aldehyde into condensation reaction. In the formulas, R is 1 to 9C alkyl group or halogen atom; respective Rs may be the same as or different from each other; p is 1 or 2 integer; q is 0, 1 or 2 integer. The compsn. which has the high resolution and is large in the change of the developing speed with respect to the change of the exposure in particular, i.e. large in the r value and with which the beautiful patterns are obtainable is obtd. in this way.
申请公布号 JPH031143(A) 申请公布日期 1991.01.07
申请号 JP19890134597 申请日期 1989.05.30
申请人 MITSUBISHI PETROCHEM CO LTD 发明人 NAKANO YOSHITOMO;KADA MASUMI;ITO SATOSHI
分类号 G03F7/023;H01L21/027 主分类号 G03F7/023
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