| 摘要 |
PURPOSE:To obtain the color filter having uniform steps of good flatness by simultaneously etching away only the high-polymer film of a lower layer in the parts corresponding to red picture elements and the high-polymer film of the upper layer in the parts corresponding to green picture elements by the second photolithography stage. CONSTITUTION:Patterns 105 of a positive type resist are formed by stages for prebaking of coated films, exposing and developing of the patterns and post baking. The resist of only the parts corresponding to the red picture elements is removed. The polyimide film of the upper layer is etched by a hydrazine etchant to form the resist film patterns 106 in the state of removing the resist only in the parts corresponding to the red and green picture elements; thereafter, the etching is executed by the hydrazine etchant. The progression of the etching in the green picture elements is then prevented by an inorg. intermediate layer 103 and only the red picture element parts are etched down onto the color filter substrate. The formation of the flat and uniform steps for each of the respective picture elements is possible in this way. |
