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发明名称
METHOD AND APPARATUS FOR THIN FILM FORMATION BY PLASMA CVD
摘要
申请公布号
EP0336979(A4)
申请公布日期
1990.12.27
申请号
EP19880908981
申请日期
1988.10.14
申请人
THE FURUKAWA ELECTRIC CO., LTD.
发明人
KOHMURA, YUKIO SHALLMAN 3-405;ISHIDA, YOSHINORI FURUKAWA DENKOH DAI 3 RYOH 417;NISHIMOTO, TAKUYA
分类号
C23C16/509;H01J37/32;H01L21/00;(IPC1-7):H01L21/205;H01L21/31
主分类号
C23C16/509
代理机构
代理人
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