| 摘要 |
PURPOSE:To improve the sensitivity and dry etching resistance of a photosensitive compsn. and to increase the remaining rate of a film by blending specified novolak resin. CONSTITUTION:This compsn. is composed essentially of alkali-soluble novolak resin and a 1,2-quinonediazido compd. The novolak resin is obtd. by condensing m-cresol, p-cresol and a compd. represented by formula I or these compd. and xylenol such as 3,5-xylenol with aldehydes such as formaldehyde. In the formula I, each of R1, R2 and R5-R7 is H, 1-4C alkyl or hydroxyl and each of R3 and R4 is H or 1-4C alkyl. 4,4'-Dihydroxydiphenylmethane may be used as the compd. represented by the formula I. |
