Producing exposure masks.

摘要

A process for producing an exposure mask comprises forming a mask film (b) on a surface of a transparent substrate (a), after which exposure processing and selective etching of the mask film are performed to form a mask pattern. The process includes correcting, upon exposure of the mask film (b) for the formation of the mask pattern, the position of the mask pattern by a different correction amount in accordance with the ratio of the area of the mask film to remain after etching to the entire area of the transparent substrate on which the mask film is stored.