发明名称 SUBSTRATE FOR FORMING BIMOLECULAR MEMBRANE
摘要 PURPOSE:To obtain the title substrate on which a stable bimolecular membrane of good reproducibility can be formed and by which the interaction between the bimolecular membranes can be freely controlled by constituting it from a thin metal sheet having a plurality of small throughholes and the inside wall of whose pores and the surface around small holes are selectively made hydrophobic. CONSTITUTION:A thin metal (e.g. Ni) sheet having at least two small throughholes by, for example, an electric field deposition is made, and SiO2 is formed on both sides on the thin sheet 1 by high-frequency sputtering. The boundary regions on the surfaces of this thin sheet 1 are masked to separate small pores into individuals 2, treated with a hydrophobic agent (e.g. hexamethyldisilazane) in a vapor phase to make it hydrophobic to obtain the title substrate constituted of a thin metal sheet which has at least two small throughholes and on which the inside walls of the small pores and the surfaces around them are selectively made hydrophobic.
申请公布号 JPH02305826(A) 申请公布日期 1990.12.19
申请号 JP19890128311 申请日期 1989.05.22
申请人 TOSHIBA CORP 发明人 YAMAGUCHI HAJIME;NAKANISHI HIROSHI
分类号 C08J5/18;B01J19/00;H05K1/02;H05K1/05 主分类号 C08J5/18
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