| 摘要 |
PURPOSE:To priorly elute such a component in photoresist which can not be removed by oxygen ashing, by washing the photoresist with an org. solvent before oxygen ashing. CONSTITUTION:A master disk 1 having a fine structure on its surface is apt to cause large surface cracks due to a component in thick areas of the resist 2 since the component can not be easily resolved or removed and remains during oxygen ashing. Namely, the component remains and condenses in recessed areas of the disk to cause roughening. Before removing the photoresist by oxygen ashing, the disk is washed with an org. solvent. By this method, the component which can not be removed with oxygen ashing can be priorly eluted, and the disk can be completely cleaned by oxygen ashing. |
