| 摘要 |
<p>PURPOSE:To make position distortion smaller by providing a radiationpenetrable pattern in the areas other than a radiation-absorber pattern, and equalizing the product of the stress and film thickness of the radiation-penetrable pattern with that of the stress and film thickness of the radiation-absorber pattern. CONSTITUTION:A radiation-absorber pattern 4 is provided on a radiation- penetrable thin film 2 provided on a housing 1. In addition, a radiation- penetrable pattern 3 is provided so as to fill up the gaps of the radiation- absorber pattern 4. And, the stress of the radiation-absorber pattern 4 is made equal to that of the radiation-penetrable pattern 3, and the occurrence of stress being distributed owing to the ununiformity of the patterns is reduced. Besides, when position distortion has been generated in the radiation-absorber pattern 4, stress is controlled by changing the film thickness of the radiation-penetrable pattern 3, without changing the film thickness of the radiation-absorber pattern 4. This makes it possible to control the generation of position distortion.</p> |
