| 摘要 |
PURPOSE:To improve pattern size controllability by development and to obtain desired signal characteristics by providing a function which prevents drops of water from sticking on a detection part and detecting the quantity of diffracted light. CONSTITUTION:While a shield plate 10 provided in front of a 0-order diffracted light detection part 6 and + or -1st-order diffracted light detection part 7 is closed, pure water is spouted at a constant flow rate from a pure water supply multi- nozzle 3 to a photoresist master disk 2 (for prewetting) to uniform the penetration of a developer to a photoresist film and to remove foreign matter. Then the shield plate 10 is opened and a developer supply nozzle 4 moves onto the photoresist master disk 2 to supply the developer at the constant flow rate. Therefore, no drops of water sticks on the 0-order diffracted light detection part 6 and + or -1st-order diffracted light detection part 7 at the time of the prewetting and the quantity of diffracted light is stably detected. Consequently, the pattern size controllability when development reaction is stopped according to a diffracted light quantity ratio is improved and desired signal characteristics are obtained. |
